✦ LIBER ✦

High resolution transmission electron microscopic study of the formation of Fe16N2 in bulk iron by ion implantation

✍ Scribed by H. Tsubakino; M. Ando; Y. Takata; M. Terasawa; T. Mitamura

Book ID: 119125631
Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 410 KB
Volume: 26
Category: Article
ISSN: 0167-577X
DOI: 10.1016/0167-577x(95)00216-2

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Formation of Fe16N2 in iron sheet by an

Formation of Fe16N2 in iron sheet by an ion implantation method

✍ H. Tsubakino; M. Ando; A. Yamamoto; S. Fukumoto; N. Terasawa; T. Mitamura 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 338 KB

Study of the Defects in Sintered SnO2 by

Study of the Defects in Sintered SnO2 by High-Resolution Transmission Electron Microscopy and Cathodoluminescence

✍ David Maestre; Julio Ramírez-Castellanos; Pedro Hidalgo; Ana Cremades; José M. G 📂 Article 📅 2007 🏛 John Wiley and Sons 🌐 English ⚖ 134 KB 👁 1 views

The formation of buried layers by high-d

The formation of buried layers by high-dose ion-implantation in Si : A TEM study

✍ A. De Veirman; J. Van Landuyt 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 278 KB

The availability of high-current implanters, now makes it possible to perform high-dose ion-implantations. By modifying the implant species, dose, energy and substrate temperature and by choosing the suitable thermal annealing conditions buried layers below a monocrystalline Si overlayer can be for