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High-Resolution Thermal Processing of Semiconductors Using Pulsed-Laser Interference Patterning

✍ Scribed by Kelly, M. K. ;Rogg, J. ;Nebel, C. E. ;Stutzmann, M. ;Kátai, Sz.

Publisher: John Wiley and Sons
Year: 1998
Tongue: English
Weight: 317 KB
Volume: 166
Category: Article
ISSN: 0031-8965
DOI: 10.1002/(sici)1521-396x(199804)166:2<651::aid-pssa651>3.0.co;2-p

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