𝔖 Bobbio Scriptorium
✦   LIBER   ✦

High-Resolution Patterning of Various Large-Area, Highly Ordered Structural Motifs by Directional Photofluidization Lithography: Sub-30-nm Line, Ellipsoid, Rectangle, and Circle Arrays

✍ Scribed by Seungwoo Lee; Hong Suk Kang; Jung-Ki Park


Publisher
John Wiley and Sons
Year
2011
Tongue
English
Weight
997 KB
Volume
21
Category
Article
ISSN
1616-301X

No coin nor oath required. For personal study only.