High-rate deposition of polycrystalline silicon thin films by hot wire cell method using disilane

✍ Scribed by Mitsuru Ichikawa; Takeshi Tsushima; Akira Yamada; Makoto Konagai

• Book ID: 108472189
• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 96 KB
• Volume: 66
• Category: Article
• ISSN: 0927-0248
• DOI: 10.1016/s0927-0248(00)00177-x