High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells

✍ Scribed by William Makoto Nakamura; Hidefumi Matsuzaki; Hiroshi Sato; Yuuki Kawashima; Kazunori Koga; Masaharu Shiratani

• Book ID: 108278688
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 867 KB
• Volume: 205
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2010.07.081