High quality, high-kgate dielectric: amorphous LaAlO3thin films grown on Si(100) without Si interfacial layer

✍ Scribed by L. Yan; H.B. Lu; G.T. Tan; F. Chen; Y.L. Zhou; G.Z. Yang; W. Liu; Z.H. Chen

• Publisher: Springer
• Year: 2003
• Tongue: English
• Weight: 328 KB
• Volume: 77
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/s00339-002-2069-1