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High purity Si–C–N thin films with tailored composition on the tie line SiC–Si3N4

✍ Scribed by Rudolphi, M.; Bruns, M.; Baumann, H.; Geckle, U.


Book ID
123190384
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
549 KB
Volume
16
Category
Article
ISSN
0925-9635

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