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High-power 0.98-/spl mu/m strained quantum-well lasers fabricated using in situ monitored reactive ion beam etching

✍ Scribed by Hamamoto, K.; Chida, H.; Miyazaki, T.; Ishikawa, S.


Book ID
119784772
Publisher
IEEE
Year
1995
Tongue
English
Weight
262 KB
Volume
7
Category
Article
ISSN
1041-1135

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