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High energy ion implantation for profiled tub formation and impurity gettering in deep submicron CMOS technology

✍ Scribed by D.C. Jacobson; A. Kamgar; D.J. Eaglesham; E.J. Lloyd; S.J. Hillenius; J.M. Poate


Book ID
113284959
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
445 KB
Volume
96
Category
Article
ISSN
0168-583X

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