✦ LIBER ✦
High energy ion implantation for C-MOS isolation n-wells technology: Problems related to the use of multicharged phosphorous ions in an industrial context
✍ Scribed by P. Spinelli; J. Escaron; A. Soubie; M. Bruel
- Book ID
- 113277342
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 467 KB
- Volume
- 6
- Category
- Article
- ISSN
- 0168-583X
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