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High dose implantation of yttrium and barium ions into copper: the use of a sacrificial carbon layer for enhanced retention

✍ Scribed by L. Clapham; J.L. Whitton; D. Rück


Book ID
113284714
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
309 KB
Volume
80-81
Category
Article
ISSN
0168-583X

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