✦ LIBER ✦
High depth to width aspect ratios in thick positive photoresist layers using near UV lithography
✍ Scribed by G. Engelmann; H. Reichl
- Book ID
- 103598576
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 275 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0167-9317
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