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High density thin film hybrid IC utilizing Ta-Al-N resistor and Ta2O5MnO2 Capacitor : J. Yamazaki, T. Kamo and M. Nakamura. Proc. IEEE 24th Electronic Components Conference, Washington D.C. 111 (13–15 May 1974)


Publisher
Elsevier Science
Year
1975
Tongue
English
Weight
120 KB
Volume
14
Category
Article
ISSN
0026-2714

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