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High current density Si field emission devices with plasma passivation and HfC coating

✍ Scribed by Rakhshandehroo, M.R.; Pang, S.W.

Book ID: 114537686
Publisher: IEEE
Year: 1999
Tongue: English
Weight: 194 KB
Volume: 46
Category: Article
ISSN: 0018-9383
DOI: 10.1109/16.753716

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