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High-breakdown-voltage Ga0.51In0.49P/GaAs I-HEMT and I2HEMT with a GaInP passivation layer grown by gas source molecular beam epitaxy

✍ Scribed by S.S. Lu; C.L. Huang; T.P. Sun


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
437 KB
Volume
38
Category
Article
ISSN
0038-1101

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