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High-aspect-ratio microstructures fabricated by X-ray lithography of polymethylsilsesquioxane-based spin-on glass thick films

✍ Scribed by Y. Liu; T. Cui; P. J. Coane; M. J. Vasile; J. Goettert


Publisher
Springer-Verlag
Year
2003
Tongue
English
Weight
103 KB
Volume
9
Category
Article
ISSN
0946-7076

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