Heterogeneous kinetics and mass transport in chemical vapour deposition processes: Part II application to silicon epitaxy

✍ Scribed by Michael L. Hitchman; Bernard J. Curtis

• Publisher: Elsevier Science
• Year: 1981
• Weight: 705 KB
• Volume: 4
• Category: Article
• ISSN: 0146-3535
• DOI: 10.1016/0146-3535(81)90006-x