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Heat of Formation for the CH 3 CHNH 2+ Cation by Photoionization Mass Spectrometry †

✍ Scribed by Traeger, John C.; Harvey, Zoë A.


Book ID
125887289
Publisher
American Chemical Society
Year
2006
Tongue
English
Weight
134 KB
Volume
110
Category
Article
ISSN
1089-5639

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To investigate processes occurring during thin-film deposition by plasma chemical vapor deposition, a study was made of the radical species in an RF CHdH\* plasma using photoionization mass spectrometry. The method avoids fragmentation of particles as can occur in conventional mass spectrometry by u