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HCl-free selective epitaxial Si-Ge growth by LPCVD for high-frequency HBTs

✍ Scribed by Kiyota, Y.; Udo, T.; Hashimoto, T.; Kodama, A.; Shimamoto, H.; Hayami, R.; Ohue, E.; Washio, K.


Book ID
114539062
Publisher
IEEE
Year
2002
Tongue
English
Weight
271 KB
Volume
49
Category
Article
ISSN
0018-9383

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