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Hardware and software for in-situ process monitor and control using multiple wavelength ellipsometry

✍ Scribed by Blaine Johs; David Doerr; Shakil Pittal; John A. Woollan; Ishwara Bhat; S. Dakshinamurthy

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 262 KB
Volume: 62
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(93)90318-i

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