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Hafnium oxide thin films deposited by high pressure reactive sputtering in atmosphere formed with different Ar/O2 ratios

✍ Scribed by M. Toledano-Luque; E. San Andrés; J. Olea; A. del Prado; I. Mártil; W. Bohne; J. Röhrich; E. Strub


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
240 KB
Volume
9
Category
Article
ISSN
1369-8001

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