✦ LIBER ✦
H+ implantation-enhanced stress relaxation in c-Si1−xGex on SiO2 during oxidation-induced Ge condensation process
✍ Scribed by T. Sadoh; R. Matsuura; M. Ninomiya; M. Nakamae; T. Enokida; H. Hagino; M. Miyao
- Book ID
- 104064196
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 240 KB
- Volume
- 8
- Category
- Article
- ISSN
- 1369-8001
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