Growth, structure and electrical characteristics of epitaxial nickel silicide from chemically electroless Ni deposition on Si

✍ Scribed by Y. S. Chang; I. J. Hsieh; J. Y. Lee

• Publisher: Springer
• Year: 1990
• Tongue: English
• Weight: 860 KB
• Volume: 25
• Category: Article
• ISSN: 0022-2461
• DOI: 10.1007/bf00638071