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Growth rate for the selective epitaxial growth of III–V compounds inside submicron shallow-trench-isolation trenches on Si (001) substrates by MOVPE: Modeling and experiments

✍ Scribed by Jiang, S.; Merckling, C.; Guo, W.; Waldron, N.; Caymax, M.; Vandervorst, W.; Seefeldt, M.; Heyns, M.


Book ID
121470329
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
740 KB
Volume
391
Category
Article
ISSN
0022-0248

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