Growth of ZnO nanocrystals in silica by rf co-sputter deposition and post-annealing
✍ Scribed by V.V. Siva Kumar; F. Singh; Amit Kumar; D.K. Avasthi
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 164 KB
- Volume
- 244
- Category
- Article
- ISSN
- 0168-583X
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✦ Synopsis
Thin films with ZnO nanocrystals in silica were synthesized by rf reactive magnetron co-sputter deposition and post-annealing. The films were deposited from a ZnO/Si composite target in an rf oxygen plasma. The deposited films were annealed in air/vacuum at high temperatures to grow ZnO nanocrystals. The deposited and annealed films were characterized by X-ray diffraction (XRD), fourier transform infrared spectroscopy (FT-IR), uv-vis spectroscopy (UV-VIS) and photoluminescence (PL) measurements. FT-IR results of the films show the vibrational features of Si-O-Si and Zn-O bonds. UV-VIS spectra of the deposited film shows the band edge of ZnO. The XRD results of the films annealed at 750 °C and 1000 °C indicate the growth of ZnO nanocrystals with average crystallite sizes between 7 nm and 26 nm. PL measurements of the deposited film show a broad visible luminescence peak which can be due to ZnO. These results suggest the growth of ZnO nanocrystals in silica matrix.