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Growth of Mixed-Phase Amorphous and Ultra Nanocrystalline Silicon Thin Films in the Low Pressure Regime by a VHF PECVD Process

✍ Scribed by Jhuma Gope; Sushil Kumar; Sukhbir Singh; C. M. S. Rauthan; P. C. Srivastava


Book ID
113108069
Publisher
Springer Netherlands
Year
2012
Tongue
English
Weight
585 KB
Volume
4
Category
Article
ISSN
1876-990X

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