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Growth of high-quality ITO thin films at low temperature by tuning the oxygen flow rate using the nano-cluster deposition (NCD) technique

✍ Scribed by S.V.N. Pammi; Anupama Chanda; Nak-Jin Seong; Soon-Gil Yoon


Book ID
108109103
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
501 KB
Volume
490
Category
Article
ISSN
0009-2614

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