✦ LIBER ✦
Growth of high quality AlInAs by low pressure organometallic chemical vapor deposition for high speed and optoelectronic device applications
✍ Scribed by R. Bhat; M.A. Koza; K. Kash; S.J. Allen; W.P. Hong; S.A. Schwarz; G.K. Chang; P. Lin
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 636 KB
- Volume
- 108
- Category
- Article
- ISSN
- 0022-0248
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