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Growth of Fe4N thin films by atmospheric pressure vapor phase epitaxy

✍ Scribed by N. Tamura; N. Takahashi; T. Nakamura; T. Takahashi


Book ID
110368579
Publisher
Springer
Year
2002
Tongue
English
Weight
378 KB
Volume
21
Category
Article
ISSN
0261-8028

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Atmospheric pressure growth of Eu-doped
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## Abstract We investigated the luminescence properties of the Eu‐doped GaN (GaN:Eu) grown at atmospheric (100 kPa) and low (10 kPa) pressures by organometallic vapor phase epitaxy (OMVPE). Although Eu concentration of atmospheric pressure GaN:Eu (AP‐GaN:Eu) is lower than that of low pressure GaN:E