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Growth of erbium-doped GaAs and InP by metalorganic chemical vapor deposition using Er(CH3C5H4)3 and Er(C5H5)3

✍ Scribed by Kunihiko Uwai; Hiroshi Nakagome; Kenichiro Takahei


Book ID
107790176
Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
478 KB
Volume
93
Category
Article
ISSN
0022-0248

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Formation of methyl radicals via the consecutive reactions H+C2H,+M+C2H,+M ( I ) and H+CLH,+CH,+CH3 (?a) was initiated by pulse radiolysis of IO-100 mbar Hz in the presence of ethylene. The kinetics of CH, were studied by monitoring the transient infrared absorption at the Q( 3, 3) line of the u,=O+