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Growth behavior of compound layers in Sn/Cu/Sn diffusion couples during annealing at 433–473 K

✍ Scribed by T. Takenaka; S. Kano; M. Kajihara; N. Kurokawa; K. Sakamoto


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
276 KB
Volume
396
Category
Article
ISSN
0921-5093

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