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Growth and characterization of heavily doped silicon crystals

✍ Scribed by R. Scala; M. Porrini; G. Borionetti

Publisher
John Wiley and Sons
Year
2011
Tongue
English
Weight
298 KB
Volume
46
Category
Article
ISSN
0232-1300

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✦ Synopsis

Abstract

Silicon crystals grown with the Czochralski method are still the most common material used for the production of electronic devices. In recent years, a growing need of large diameter crystals with increasingly higher doping levels is observed, especially to support the expanding market of discrete devices and its trend towards lower and lower resistivity levels for the silicon substrate. The growth of such heavily doped, large‐diameter crystals poses several new challenges to the crystal grower, and the presence of a high dopant concentration in the crystal affects significantly its main properties, requiring also the development of dedicated characterization techniques. This paper illustrates the recent advances in the growth and characterization of silicon crystals heavily doped with antimony, arsenic, phosphorus and boron. (Β© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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