Growing InN films by plasma-assisted metalorganic vapor-phase epitaxy on Al2O3and YSZ substrates in plasma generated by gyrotron radiation under electron cyclotron resonance conditions

✍ Scribed by Buzynin, Yu. N.; Viktorov, M. E.; Vodop’yanov, A. V.; Golubev, S. V.; Drozdov, M. N.; Drozdov, Yu. N.; Luk’yanov, A. Yu.; Mansfeld, D. A.; Skorokhodov, E. V.; Khrykin, O. I.; Shashkin, V. I.

• Book ID: 120514103
• Publisher: SP MAIK Nauka/Interperiodica
• Year: 2013
• Tongue: English
• Weight: 246 KB
• Volume: 39
• Category: Article
• ISSN: 1063-7850
• DOI: 10.1134/S1063785013010069