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Germanium negative-ion implantation into SiO2 layer on Si: Photoluminescence properties and oxidation state of Ge atoms in subsequent heat treatment

✍ Scribed by Hiroshi Tsuji; Nobutoshi Arai; Masashi Hattori; Masayuki Ohsaki; Yasuhito Gotoh; Junzo Ishikawa


Book ID
113919499
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
216 KB
Volume
206
Category
Article
ISSN
0257-8972

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