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Ge-doped SiO2 thin films produced by helicon activated reactive evaporation

โœ Scribed by W.T Li; D.A.P Bulla; C Charles; R Boswell; J Love; B Luther-Davies


Book ID
108388486
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
396 KB
Volume
419
Category
Article
ISSN
0040-6090

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