Gate oxide leakage due to temperature accelerated degradation under plasma charging conditions

✍ Scribed by Tomasz Brożek; Y.David Chan; Chand R Viswanathan

• Book ID: 108362224
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 286 KB
• Volume: 38
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/s0026-2714(97)00076-0