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Gate Capacitance Reduction Due to the Inversion Layer in High- /Metal Gate Stacks Within a Subnanometer EOT Regime

✍ Scribed by Iijima, R.; Edge, L.F.; Ariyoshi, K.; Bruley, J.; Paruchuri, V.; Takayanagi, M.


Book ID
114620380
Publisher
IEEE
Year
2011
Tongue
English
Weight
405 KB
Volume
58
Category
Article
ISSN
0018-9383

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