Gas-phase reactions of CF3and CF2with atomic and molecular fluorine: Their significance in plasma etching
β Scribed by I. C. Plumb; K. R. Ryan
- Publisher
- Springer
- Year
- 1986
- Tongue
- English
- Weight
- 599 KB
- Volume
- 6
- Category
- Article
- ISSN
- 0272-4324
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π SIMILAR VOLUMES
Rate constants for the reactions of N and 0 with CF and CF2 radicals have been measured in a gas-flow system with photoionization mass spectrometry detection. CF( % 211,,2,,,2) and CF,(% 'A, ) radicals were produced in a radiofrequency discbarge of CFBr3 and CF2Br?, respectively. Atomic reactants we
The following reactions: (1, -1) . CF, + CzFSC1 CF&l + ' CzF5 (2) (3) were studied over the temperature ranges 533-687 K, 563-663 K, and 503-613 K for the forward reactions respectively and over 683-763 K, for the back reaction. Arrhenius parameters for chlorine atom transfer were determined re