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Gas-phase ion chemistry in XH4C3H4ZH3 (XSi, Ge; ZN, P) mixtures

✍ Scribed by Lorenza Operti; Roberto Rabezzana; Francesca Turco; Gian Angelo Vaglio

Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
148 KB
Volume
40
Category
Article
ISSN
1076-5174

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✦ Synopsis

Abstract

The gas‐phase ion chemistry of silane–allene–ammonia, germane–allene (or propyne)–ammonia (or phosphine) systems was studied by ion trap mass spectrometry. Reaction sequences were determined and rate constants were measured for the main processes observed. The mixture containing silane displays higher reactivity with respect to that with germane. Comparison with analogous systems provides useful information about the reactivity of different hydrocarbon molecules and the different affinities of silicon and germanium towards nitrogen and phosphorus. The most interesting product ions observed are those containing Si (or Ge), C and N (or P) elements together, as these ion species may be considered precursors of doped amorphous carbides, which are widely used in semiconductor devices. Copyright © 2005 John Wiley & Sons, Ltd.

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