Gas Phase Epoxidation of Propylene with TS-1 and in Situ H2O2 Produced by a H2/O2 Plasma

✍ Scribed by Ji SU; Juncheng ZHOU; Chunyan LIU; Xiangsheng WANG; Hongchen GUO

• Publisher: Elsevier Science
• Year: 2010
• Weight: 254 KB
• Volume: 31
• Category: Article
• ISSN: 1872-2067
• DOI: 10.1016/s1872-2067(10)60111-8

✦ Synopsis

Gas phase epoxidation of propylene was performed by directly contacting propylene and gaseous H 2 O 2 on the surface of TS-1 catalyst in an integrated reactor. The gaseous H 2 O 2 was produced in situ by a H 2 /O 2 plasma. The H 2 O 2 formation rate can be enhanced by increasing the power density of the H 2 /O 2 plasma reactor. The yield and selectivity for propylene oxide (PO) can be increased by optimizing the reaction conditions and using suitable TS-1 catalysts. With a power injection of 3.5 W, flow rates of H 2 , O 2 , and propylene of 170, 8, and 18 ml/min, respectively, catalyst loading of 0.8 g, and epoxidation temperature of 110 o C, the yield and selectivity for PO and the utilization rate of H 2 O 2 were 246.9 g/(kg•h), 95.4%, and 36.1%, respectively. During the gas phase reaction, no decline of TS-1 activity was observed.