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Gas phase considerations for the growth of device quality nanocrystalline silicon at high rate

✍ Scribed by J.K. Rath; A.D. Verkerk; Y. Liu; M. Brinza; W.J. Goedheer; R.E.I. Schropp

Book ID: 108215602
Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 442 KB
Volume: 159-160
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2008.10.035

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