the removA of SOz and/or N0, using an oxidizing Liquid solution, absorbers with a high mass lransfcr ctliciplcy 8re required. Here, B centrifugal gas-liquid absorber has been designed and studied; the chotin deviw is a rotor with blades which induce the bmwnion of 4 thin liquid film OII the realtor wall. The operating parameters that can be varied are the rotation spesd, the back pressure at the liquid outlet and tha gas and liquid flow rates. Three distinct flow regimes can be visualize& depending on the values of the parameters. The hydrodynamic regimes vary from thin liquid film containing disper& gas bubbles with large gas holdup to thick fdms contamrng virtually no gas. Rersidentz time distributions orrhc liquid phase allow to mca~urc the liquid film volume (liquid holdup) in the reactor and the dispertion me&imt. The liquid volume mcrea~s with back pressure but decreaw with increasing rotation speed. The &let number decreases with increasing back pressure. In the investigated range. no infhren~ oftbe liquid and gas flow rates was found on either of the abow two lacldtg Furthermore, the liquid volume and the Peclet number can easily be correlated to the Euler number, which is the ratio ol the relative back. procure to the centrifugal pressure. A hydrodynamic model based on a pressure balance in the reactor leads to the expression uf the liquid film thickntirs along the height of the blade as a fuactiwn of Euler number and Ap*, the dimensionI= ratio of the relative back pressure to the gravity* Thw two dimensionless numbers depend only on the operating paramefers. The angular liquid velocity wag supposed to be proportional IO the rolor angular v&city; the shift c&Xcient k is determined from the experimental values of the Liquid holdup. Results show that k can be correlated-to the Euler number. Using these results, calculated liquid film thickness profiles are presented and discussed.