High-dose oxygen implantation of multila
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D.A. Lilienfeld; P. BΓΈrgesen
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Article
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1991
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Elsevier Science
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English
β 567 KB
A high-dose ion implantation technique for the formation of high-temperature superconducting thin films on silicon substrates is investigated. This technique consists of three steps: (1) deposition of a multilayer sample of the appropriate composition, (2) implantation of oxygen to mix the layers an