𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Gallium arsenide surface chemistry and surface damage in a chlorine high density plasma etch process

✍ Scribed by C. R. Eddy; O. J. Glembocki; D. Leonhardt; V. A. Shamamian; R. T. Holm; B. D. Thoms; J. E. Butler; S. W. Pang


Book ID
107457471
Publisher
Springer US
Year
1997
Tongue
English
Weight
189 KB
Volume
26
Category
Article
ISSN
0361-5235

No coin nor oath required. For personal study only.