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GaAs/Ge3N4/Al structures and mis field-effect transistors based on them

✍ Scribed by G.D. Bagratishvili; R.B. Dzhanelidze; N.I. Kurdiani; Yu.I. Pashintsev; O.V. Saksaganski; V.A. Skorikov


Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
205 KB
Volume
56
Category
Article
ISSN
0040-6090

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RF and DC characteristics in Al2O3/Si3N4
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## Abstract Al~2~O~3~/Si~3~N~4~ insulated‐gate AlGaN/GaN heterostructure field‐effect transistors (HFETs) have been fabricated, where the regrown ohmic structure was incorporated to reduce the contact resistance. Excellent DC and RF characteristics have been obtained together with the low gate leak