Full CMP integration of CVD TiN damascene sub-0.1-μm metal gate devices for ULSI applications

✍ Scribed by Ducroquet, F.; Achard, H.; Coudert, F.; Previtali, B.; Lugand, J.-F.; Ulmer, L.; Farjot, T.; Gobil, Y.; Heitzmann, M.; Tedesco, S.; Nier, M.E.; Deleonibus, S.

• Book ID: 114538799
• Publisher: IEEE
• Year: 2001
• Tongue: English
• Weight: 158 KB
• Volume: 48
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.936712