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Free-standing diamond wafers deposited by multi-cathode, direct-current, plasma-assisted chemical vapor deposition

โœ Scribed by Lee, Jae-Kap; Eun, Kwang Yong; Chae, Hee-Baik; Baik, Young-Joon


Book ID
121313075
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
235 KB
Volume
9
Category
Article
ISSN
0925-9635

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