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Formation of TiSi2 from titanium and amorphous silicon layers for local interconnect technology

✍ Scribed by A.A. Bos; N.S. Parekh; A.G.M. Jonkers


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
664 KB
Volume
197
Category
Article
ISSN
0040-6090

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