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Formation of thick and narrow-spacing metal patterns by lift-off technique using negative photoresists, LMR and LMR-UV

✍ Scribed by Yoshio Yamashita; Ryuji Kawazu; Toshio Itoh; Kazutami Kawamura; Seigo Ohno; Kenji Kobayashi; Takateru Asano; Gentaro Nagamatsu


Book ID
103597823
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
278 KB
Volume
3
Category
Article
ISSN
0167-9317

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