Formation of SiO2/Si structure with low interface state density by atmospheric-pressure VHF plasma oxidation

✍ Scribed by Zhuo, Zeteng; Sannomiya, Yuta; Goto, Kazuma; Yamada, Takahiro; Ohmi, Hiromasa; Kakiuchi, Hiroaki; Yasutake, Kiyoshi

• Book ID: 123406254
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 719 KB
• Volume: 12
• Category: Article
• ISSN: 1567-1739
• DOI: 10.1016/j.cap.2012.04.015